The Talos F200X 200keV field emission scanning/transmission electron microscope is a versatile instrument for characterization of various materials. The X-FEG high-brightness electron source delivers high total current—up to five times the beam current of a standard Schottky FEG—while the integrated EDS system with four silicon drift detectors (SDDs) offers mapping capabilities of up to 105 spectra/s.
Different capabilities of TEM:
a) Dislocation arrangement in 3D-printed Inconel
b) Atomic structure of a precipitate in NiTiHf alloy
EDX chemical mapping of 3D-printed Inconel 718 using STEM/EDX technique